SMT & Inspection | February 28, 2006
Obducat nano-imprint heading<br>for mass production
Editor: Jesper Olsson
Obducat has now showed its next-generation nano-imprint lithography machine for mass production.
The system from Sweden based Obducat can handle resolutions of 30 nm and below with a 200-mm tool. According to the company the machine has a throughput of 30 wafers an hour.
