Fujifilm to invest $83M in semiconductor materials facility in India
The investments are expected to be made in two phases starting from October 2026, with commercial production starting in the fiscal year 2028.
Japan’s Fujifilm has said that it plans to set up a greenfield semiconductor materials manufacturing facility in India with a total investment of around USD 83 million.
The investments are expected to be made in two phases starting from October 2026, with commercial production starting in the fiscal year 2028, according to a report by Indian news agency PTI.
Under Phase 1, the company will support front-end process chemicals, while Phase 2 will focus on semiconductor surface conditioning materials and high-purity chemicals.
“Fujifilm will work closely with the vision of the India Semiconductor Mission and seeks to utilise the patronage of the Government of India under the ISM 2.0 policy, which was approved by the Government of India in July 2026,” the company said, according to the PTI report.
