Fujifilm completes new production facility in Oita
This investment will significantly expand production capacity for post-CMP cleaners used in the manufacturing of advanced semiconductors, including those for AI applications, for which demand is growing rapidly.
Japan’s Fujifilm has announced the completion of a new production building for post-CMP cleaners at the Oita Factory of Fujifilm Electronic Materials (FFEM), the core company leading Fujifilm’s semiconductor materials business.
The facility began operations in August. This investment will significantly expand production capacity for post-CMP cleaners used in the manufacturing of advanced semiconductors, including those for AI applications, for which demand is growing rapidly, Fujifilm said in a news release.
Fujifilm will further accelerate the growth of its semiconductor materials business to meet the rising demand for semiconductors supporting the advanced information society, including semiconductors for AI data centers and other applications.
The post-CMP cleaners manufactured at the Oita factory are used after CMP processes to remove particles, trace metals, and organic residues while protecting metal surfaces. Demand is rapidly increasing not only for CMP slurries, which are essential for planarization processes required to improve semiconductor performance, but also for post-CMP cleaners used in subsequent cleaning processes.
“Leveraging its strength in providing integrated solutions incorporating both CMP slurries and post-CMP cleaners, Fujifilm is expanding sales globally, particularly among customers in North America, Europe, and key semiconductor manufacturing hubs in Asia, where demand growth in the advanced semiconductor market remains strong,” the company said.
The new production building is equipped with automated manufacturing facilities and quality evaluation equipment designed to meet the extremely high purity requirements of cutting-edge semiconductor materials, the company said.
