Electronics Production | June 29, 2005

ASML wins legal victory over Ultratech

Dutch photolithography specialist ASML Holding B.V. has won a legal victory by a US federal district court jury.
The jury found that a patent held by Ultratech Inc. was invalid and that ASML was not liable for infringement, according to law firm, which represented ASML during the trial.

San Jose-based Ultratech originally filed suit in May 2000, charging infringement against a host of photolithography equipment makers, including Nikon and Canon. Both Nikon and Canon chose to settle and entered into licensing agreements with Ultratech. ASML's defense was that step-and-scan systems represented prior art and therefore could not infringe.


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