PCB | October 29, 2010

Carl Zeiss and Synopsys collaborate

Carl Zeiss and Synopsys collaborate on in-die registration metrology for photomask manufacturing.
Carl Zeiss SMS will support the ZEISS tool family for in–die metrology solutions for the 32nm technology node and below. Synopsys will offer support for ZEISS’ PROVE, the next-generation registration metrology tool, through Synopsys’ CATS. Using CATS as the data preparation engine, mask engineers using PROVE can benefit from improved efficiency and usability of a registration metrology system that meets stringent overlay accuracy requirements.

Strong optical proximity correction and double patterning techniques, required to extend 193nm lithography to the next technology nodes, demand greater photomask pattern placement accuracy. The new PROVE system meets these increased demands with its concept of 193nm illumination optics. It delivers an in-die metrology capability for measurement of the smallest production features without placing registration marks, enabling mask makers to measure and analyse registration in critical areas on the mask.


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Further details can be found here.
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