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Electronics Production | February 14, 2011

Synopsys and Varian collaborate

Synopsys and Varian Semiconductor Equipment Associates (VSEA) collaborate on the development of Technology CAD (TCAD) models for cryogenic ion implantation.
Through this collaboration, Synopsys will use experimental data from Varian’s cryogenic implant process to develop and calibrate models for its TCAD Sentaurus tools, which are widely used by semiconductor companies in the development and optimisation of new manufacturing technologies.

“To reduce development time and cost, our customers need TCAD models that are calibrated to the actual equipment used to fabricate the silicon,” said Howard Ko, senior vice president and general manager of the Silicon Engineering Group at Synopsys. “Our joint work with Varian to develop TCAD models for this new cryogenic implant process is an example of our commitment to keep our TCAD Sentaurus tools at the forefront of semiconductor process development.”

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