The tool will be used for research and manufacturing of various kinds of micro-optical and diffractive elements, new materials as well as masks for optical lithography.

A research institute in Poland, ITME works in the multidisciplinary area of research, development and manufacturing of materials, devices and components for application in electronics, micromechanics and optoelectronics.

"With the Vistec SB251 our long term partner ITME receives an advanced electron-beam lithography system. Due to its high flexibility and reliability the SB251 is perfectly tailored to the diversified applications ITME is facing now and will be challenged with in the future", said Wolfgang Dorl, General manager of Vistec Electron Beam. "We are very pleased that ITME placed the order with Vistec, which further continues our successful collaboration started more than 20 years ago."